Mechanical loss of silicon nitride films grown by plasma-enhanced chemical vapor deposition (PECVD) method

Document #:

LIGO-G1300171-v1

Document type:

G - Presentations (eg Graphics)

Abstract:

Preliminary report of the mechanical loss of the silicon nitride films were given.

Files in Document:

• Mechanical loss of silicon nitride films grown by plas...pdf (4.8 MB)

Other Files:

• USA conference of Silicon nitride 20130309.pdf (77.9 kB)

Topics:

• Meeting

Authors:

• Shiuh Chao
• Huang-wei Pan
• Ling-Chi Kuo

Keywords:

silicon nitride films