LIGO Document G1501068-v2
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Room temperature mechanical loss of high stress silicon nitride film measured by cantilever ring-down method on double-side coated cantilever
Document #:
LIGO-G1501068-v2
Document type:
G - Presentations (eg Graphics)
Other Versions:
Abstract:
We report results of the loss angle measurement for high stress PECVD silicon nitride films.
Files in Document:
LVC meeting SiN 20150831.pdf
(1.4 MB)
Topics:
Meeting
Authors:
Shiuh Chao
Huang-wei Pan
Shu-Yu Huang
Ling-Chi Kuo
Keywords:
silicon
nitride
Referenced by:
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