In-vacuum witnes plate fixture for a 4" silicon wafer - upper

Document #:

LIGO-D1201032-v1

Document type:

D - Drawings

Abstract:

This part was designed by Cheryl Vorvick and Tyler Guidry, to hold 4" silicon wafers placed in the Ligo vacuum system to collect particulates for contamination analysis.

Files in Document:

• D1201032-v1 100mm wafer in-vacuum witness plate fixtur...pdf (61.1 kB)

ICS/JIRA Record:

• ICS_LINK

Topics:

• Vacuum
• Basic R&D

Authors:

• Cheryl Vorvick

Keywords:

Vacuum Contamination 4" wafer witness plate fixture

Related Documents:

• LIGO-D1201033: In-vacuum witnes plate fixture for a 4" silicon wafer - lower

Referenced by:

• LIGO-D1201033-v3: In-vacuum witnes plate fixture for a 4" silicon wafer - lower